RF Inductors on Nanocrystalline Silicon Passivated HR-Si Substrates

R. L. Wang; Y. R. Lin; P. Y. Liu; C. J. Chen; Y. K. Su; T. J. Hsueh

doi:https://doi.org/10.7567/SSDM.2012.PS-2-10

2012 International Conference on Solid State Devices and Materials

2012年9月25日〜 2012年9月27日
Kyoto International Conference Center, Kyoto, Japan

[PS-2-10] RF Inductors on Nanocrystalline Silicon Passivated HR-Si Substrates

R. L. Wang¹、Y. R. Lin¹、P. Y. Liu¹、C. J. Chen²、Y. K. Su²、T. J. Hsueh³ (1.National Kaohsiung Normal Univ.、2.National Cheng Kung Univ.、3.National Nano Device Labs. , Taiwan)

https://doi.org/10.7567/SSDM.2012.PS-2-10

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