The Japan Society of Applied Physics

[PS-2-7] The results of self annealing process for a copper interconnection on the 4xnm DRAM Products

H. J. Park1、I. C. Ryu2、S. H. Son2、J. S. Im3、J. H. Kwon3、Y. P. Song1、K. S. Jang1、C. R. Lee1、J. O. Nam1、K. I. Yoon1、K. S. Yoon1 (1.DRAM Development Division、2.Research Divisoin、3.Manufacturing Division , Korea)

https://doi.org/10.7567/SSDM.2012.PS-2-7