[A-8-1] Metal Oxide RRAM For Next Generation Mass Storage: 3D Vertical Architecture and Electrode/Oxide Interface Engineering

H.Y. Chen¹, S. Yu¹, B. Gao², Y. Deng², P. Huang², H. Tian³, Z. Jiang¹, Y. Wu¹, T. Ren³, J.F. Kang², H.S.P. Wong¹ (1.Stanford Univ., 2.Peking Univ., 3.Tsinghua Univ. (USA))

https://doi.org/10.7567/SSDM.2013.A-8-1