[C-4-3] Ultra-low Damage Fabrication of Graphene Nanoribbons by Neutral Beam Etching

T. Okada¹, C.Y. Su², C.H. Huang², K. Igarashi¹, A. Wada¹, L.J. Li³, K.I. Ho², P.W. Li⁴, I.H. Chen⁴, C.S. Lai², S. Samukawa^1,5 (1.Tohoku Univ., 2.Chang Gung Univ., 3.Academia Sinica, 4.National Central Univ., 5.WPI-AIMR, Tohoku Univ. (Japan))

https://doi.org/10.7567/SSDM.2013.C-4-3