[C-4-3] Ultra-low Damage Fabrication of Graphene Nanoribbons by Neutral Beam Etching

T. Okada¹、C.Y. Su²、C.H. Huang²、K. Igarashi¹、A. Wada¹、L.J. Li³、K.I. Ho²、P.W. Li⁴、I.H. Chen⁴、C.S. Lai²、S. Samukawa^1,5 (1.Tohoku Univ.、2.Chang Gung Univ.、3.Academia Sinica、4.National Central Univ.、5.WPI-AIMR, Tohoku Univ. (Japan))

https://doi.org/10.7567/SSDM.2013.C-4-3