[G-6-3] Polarity Dependence on Electrical Properties of Low-k Dielectric in Copper Interconnect Structures

M. Lin¹, J. Liang¹, A. Juan¹, K.C. Su¹ (1.United Microelectronics Corp. (Taiwan))

https://doi.org/10.7567/SSDM.2013.G-6-3