The Japan Society of Applied Physics

[J-1-3] Effect of Gate Insulator Material on Dynamic On-Resistance in GaN MIS-HEMT on 6-inch Si

S. Akiyama1, Y. Watanabe1, T. Wakabayashi1, K. Nukui1, Y. Kotani1, T. Ogino1, T. Hosoda1, M. Kanamura2, K. Joshin2, T. Kikkawa2 (1.Fujitsu Semiconductor Ltd., 2.Fujitsu Labs. (Japan))

https://doi.org/10.7567/SSDM.2013.J-1-3