The Japan Society of Applied Physics

[N-6-2] Impurities distribution and recombination activity in as-grown and annealed multicrystalline silicon

T. Kojima1、T. Tachibana1、N. Kojima1、Y. Ohshita1、K. Arafune2、A. Ogura3、M. Yamaguchi1 (1.Toyota Tech. Inst.、2.Univ. Hyogo、3.Meiji Univ. (Japan))

https://doi.org/10.7567/SSDM.2013.N-6-2