[PS-14-3] Floating Field Plate HV-MOSFET by 28nm High-k Metal Gate Process

J.M. Wang¹、P.C. Peng¹、T.L. Lee¹、Y.C. King¹、C.J. Lin¹ (1.National Tsing Hua Univ. (Taiwan))

https://doi.org/10.7567/SSDM.2013.PS-14-3