[PS-15-2] Influence of Post-Deposition Annealing on the Passivation Quality of Room Temperature Atomic Layer Deposited Aluminum Oxide

H. Lee^1,4, T. Nagata³, N. Ikeno¹, K. Arafune^2,4, H. Yoshida^2,4, S. Satoh^2,4, T. Chikyow³, A. Ogura^1,4 (1.Meiji Univ., 2.Univ. of Hyogo, 3.National Inst. of Materials Sci., 4.JST-CREST (Japan))

https://doi.org/10.7567/SSDM.2013.PS-15-2