[PS-15-2] Influence of Post-Deposition Annealing on the Passivation Quality of Room Temperature Atomic Layer Deposited Aluminum Oxide

H. Lee^1,4、T. Nagata³、N. Ikeno¹、K. Arafune^2,4、H. Yoshida^2,4、S. Satoh^2,4、T. Chikyow³、A. Ogura^1,4 (1.Meiji Univ.、2.Univ. of Hyogo、3.National Inst. of Materials Sci.、4.JST-CREST (Japan))

https://doi.org/10.7567/SSDM.2013.PS-15-2