[PS-3-2] Effects of Rutile TiO2 Interlayer on HfO2/Ge MOS Structure K. Kobashi1,2, T. Nagata2, T. Nabatame2, Y. Yamashita2, A. Ogura1, T. Chikyow2 (1.Meiji Univ., 2.NIMS (Japan)) https://doi.org/10.7567/SSDM.2013.PS-3-2