[PS-6-33L] GaSb-on-insulator metal-oxide-semiconductor field-effect transistors on Si fabricated by direct wafer bonding technology
M. Yokoyama1, H. Yokoyama2, M. Takenaka1, S. Takagi1
(1.Univ. of Tokyo, 2.NTT Photonics Labs., NTT Corp. (Japan))
https://doi.org/10.7567/SSDM.2013.PS-6-33L