Process Control for Silicon Photonics using 300mm SOI Wafers

F. Boeuf; S. Cremer; N. Vulliet; B. Orlando; F. Leverd; D. Ristoiu; C. Baudot; S. Joblot; D. Pelissier-Tanon; S. Jan; H. Petiton; A. Mekis; T. Pinguet; L. Verslegers

doi:https://doi.org/10.7567/SSDM.2014.B-7-2

2014 International Conference on Solid State Devices and Materials

2014年9月8日〜 2014年9月11日
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[B-7-2] Process Control for Silicon Photonics using 300mm SOI Wafers

F. Boeuf¹、S. Cremer¹、N. Vulliet¹、B. Orlando¹、F. Leverd¹、D. Ristoiu¹、C. Baudot¹、S. Joblot¹、D. Pelissier-Tanon¹、S. Jan¹、H. Petiton¹、A. Mekis²、T. Pinguet²、L. Verslegers² (1.STMicroelectronics、2.Luxtera (France))

https://doi.org/10.7567/SSDM.2014.B-7-2

▲