Process Control for Silicon Photonics using 300mm SOI Wafers

F. Boeuf; S. Cremer; N. Vulliet; B. Orlando; F. Leverd; D. Ristoiu; C. Baudot; S. Joblot; D. Pelissier-Tanon; S. Jan; H. Petiton; A. Mekis; T. Pinguet; L. Verslegers

doi:https://doi.org/10.7567/SSDM.2014.B-7-2

2014 International Conference on Solid State Devices and Materials

Sep 8, 2014 - Sep 11, 2014
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[B-7-2] Process Control for Silicon Photonics using 300mm SOI Wafers

F. Boeuf¹, S. Cremer¹, N. Vulliet¹, B. Orlando¹, F. Leverd¹, D. Ristoiu¹, C. Baudot¹, S. Joblot¹, D. Pelissier-Tanon¹, S. Jan¹, H. Petiton¹, A. Mekis², T. Pinguet², L. Verslegers² (1.STMicroelectronics, 2.Luxtera (France))

https://doi.org/10.7567/SSDM.2014.B-7-2

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