[E-1-2] Combined PEALD Gate-Dielectric and In-Situ SiN Cap-Layer for Reduced Vth Shift and RDS-ON Dispersion of AlGaN/GaN HEMTs on 200 mm Si Wafer
N. Ronchi1, B. De Jaeger1, M. Van Hove1, R. Roelofs2, T.L. Wu1,3, J. Hu1,3, X. Kang1, S. Decoutere1
(1.imec, 2.ASM, 3.KU Leuven (Belgium))
https://doi.org/10.7567/SSDM.2014.E-1-2