[E-7-1] High-speed and Low-leakage Characteristics of 60-nm C-axis Aligned Crystalline Oxide Semiconductor FET with GHz-ordered Cutoff Frequency

Y. Yakubo¹、S. Nagatsuka¹、S. Matsuda¹、S. Hondo¹、Y. Hata¹、Y. Okazaki¹、Y. Yamamoto¹、M. Nagai¹、S. Sasagawa¹、T. Atsumi¹、M. Sakakura¹、T. Nakura²、Y. Yamamoto¹、S. Yamazaki¹ (1.Semiconductor Energy Lab. Corp., Ltd.、2.Univ. of Tokyo (Japan))

https://doi.org/10.7567/SSDM.2014.E-7-1