Heated Ion Implantation Technology for High Performance SOI FinFETs

W. Mizubayashi; H. Onoda; Y. Nakashima; Y. Ishikawa; T. Matsukawa; K. Endo; Y.X. Liu; S. O'uchi; J. Tsukada; H. Yamauchi; S. Migita; Y. Morita; H. Ota; M. Masahara

doi:https://doi.org/10.7567/SSDM.2014.F-1-1

2014 International Conference on Solid State Devices and Materials

2014年9月8日〜 2014年9月11日
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[F-1-1] Heated Ion Implantation Technology for High Performance SOI FinFETs

W. Mizubayashi¹、H. Onoda¹、Y. Nakashima¹、Y. Ishikawa¹、T. Matsukawa¹、K. Endo¹、Y.X. Liu¹、S. O'uchi¹、J. Tsukada¹、H. Yamauchi¹、S. Migita¹、Y. Morita¹、H. Ota¹、M. Masahara¹ (1.AIST (Japan))

https://doi.org/10.7567/SSDM.2014.F-1-1

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