Heated Ion Implantation Technology for High Performance SOI FinFETs

W. Mizubayashi; H. Onoda; Y. Nakashima; Y. Ishikawa; T. Matsukawa; K. Endo; Y.X. Liu; S. O'uchi; J. Tsukada; H. Yamauchi; S. Migita; Y. Morita; H. Ota; M. Masahara

doi:https://doi.org/10.7567/SSDM.2014.F-1-1

2014 International Conference on Solid State Devices and Materials

Sep 8, 2014 - Sep 11, 2014
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[F-1-1] Heated Ion Implantation Technology for High Performance SOI FinFETs

W. Mizubayashi¹, H. Onoda¹, Y. Nakashima¹, Y. Ishikawa¹, T. Matsukawa¹, K. Endo¹, Y.X. Liu¹, S. O'uchi¹, J. Tsukada¹, H. Yamauchi¹, S. Migita¹, Y. Morita¹, H. Ota¹, M. Masahara¹ (1.AIST (Japan))

https://doi.org/10.7567/SSDM.2014.F-1-1

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