[P-9-1] Multi-Layered MoS₂ Thin Film Formed by High-Temperature Sputtering for Enhancement-Mode nMOSFETs

T. Ohashi¹, K. Suda², S. Ishihara², N. Sawamoto², S. Yamaguchi¹, K. Matsuura¹, K. Kakushima¹, N. Sugii¹, A. Nishiyama¹, Y. Kataoka¹, K. Natori¹, K. Tsutsui¹, H. Iwai¹, A. Ogura², H. Wakabayashi¹ (1.Tokyo Tech, 2.Meiji Univ. (Japan))

https://doi.org/10.7567/SSDM.2014.P-9-1