[P-9-1] Multi-Layered MoS₂ Thin Film Formed by High-Temperature Sputtering for Enhancement-Mode nMOSFETs

T. Ohashi¹、K. Suda²、S. Ishihara²、N. Sawamoto²、S. Yamaguchi¹、K. Matsuura¹、K. Kakushima¹、N. Sugii¹、A. Nishiyama¹、Y. Kataoka¹、K. Natori¹、K. Tsutsui¹、H. Iwai¹、A. Ogura²、H. Wakabayashi¹ (1.Tokyo Tech、2.Meiji Univ. (Japan))

https://doi.org/10.7567/SSDM.2014.P-9-1