[PS-8-10] Effects of Annealing on In-Ga-Zn-Oxide Films
K. Okazaki1、H. Kanemura1、Y. Hosaka1、T. Obonai1、M. Oota2、M. Takahashi2、S. Nishino2、S. Yamazaki2
(1.Advanced Film Device Inc.、2.Semiconductor Energy Lab. Co., Ltd. (Japan))
https://doi.org/10.7567/SSDM.2014.PS-8-10