11:05 〜 11:25

[K-7-2] Degradation Investigation of High-k/Metal Gate nMOSFETs by 3D KMC with Multiple Traps Interactions

^○Y. Li¹, H. Jiang¹, Z. Y. Lun¹, Y. J. Wang¹, P. Huang¹, H. Hao¹, G. Du¹, X. Zhang¹, X. Y. Liu¹ (1.Peking Univ.(China))

https://doi.org/10.7567/SSDM.2015.K-7-2