[PS-1-6] Fabrication of Low-Temperature (< 400 °C) Germanium MOSCAPs by Microwave Thermal Oxidation

^○W. C. Chi¹, C. C. Hsu^1,2, C. H. Chou¹, A. S. Shih¹, Y. J. Lee², C. H. Chien¹ (1.National Chiao Tung Univ., 2.National Nano Device Labs.(Taiwan))

https://doi.org/10.7567/SSDM.2015.PS-1-6