The Japan Society of Applied Physics

[PS-4-2] Transition Metal Complex Reaction Etching for MRAM Applications using Neutral Beam and Its Mechanism Investigated by First-Principles Calculation

T. Kubota1, Y. Kikuchi1,2, T. Nozawa2, S. Samukawa1,3 (1.IFS, Tohoku Univ., 2.Tokyo Electron Ltd., 3.WPI-AIMR, Tohoku Univ.(Japan))

https://doi.org/10.7567/SSDM.2015.PS-4-2