The Japan Society of Applied Physics

[PS-8-13] Improving Crystalline Quality of Sputtering Deposited MoS2 Thin Film by Post-Sulfurization Annealing Using (t-C4H9)2S2

S. Ishihara1, K. Suda1, Y. Hibino1, N. Sawamoto1, T. Ohashi2, S. Yamaguchi2, K. Matsuura2, H. Machida3, M. Ishikawa3, H. Sudoh3, H. Wakabayashi2, A. Ogura1 (1.Meiji Univ., 2.Tokyo Tech, 3.Gas-phase Growth Ltd.(Japan))

https://doi.org/10.7567/SSDM.2015.PS-8-13