The Japan Society of Applied Physics

[PS-9-8] Gate-Stacking Engineering for Insta Ge/SiO2/SiGe MOS Devices

P. H. Liao1, W. T. Lai2, S. C. Luo1, K. C. Yang1, T. George1, P. W. Li2 (1.National Central Univ., 2.National Chiao Tung Univ.(Taiwan))