The Japan Society of Applied Physics

1:50 PM - 2:10 PM

[B-4-02] 3.3V Write-voltage Ir/Ca0.2Sr0.8Bi2Ta2O9/HfO2/Si Ferroelectric-gate Field-effect Transistors with 109 Endurance and Good Retention

W. Zhang1,2, M. Takahashi1, Y. Sasaki2, M. Kusuhara2, S. Sakai1 (1.AIST(Japan), 2.WACOM R&D Corp.(Japan))

https://doi.org/10.7567/SSDM.2016.B-4-02