13:50 〜 14:10
[B-4-02] 3.3V Write-voltage Ir/Ca0.2Sr0.8Bi2Ta2O9/HfO2/Si Ferroelectric-gate Field-effect Transistors with 109 Endurance and Good Retention
○W. Zhang1,2, M. Takahashi1, Y. Sasaki2, M. Kusuhara2, S. Sakai1
(1.AIST(Japan), 2.WACOM R&D Corp.(Japan))
https://doi.org/10.7567/SSDM.2016.B-4-02