14:15 〜 14:30

[N-4-03] Band Offset of Al₂O₃/SiO₂ Nano-laminate on GaN Evaluated by Hard X-ray Photoelectron Spectroscopy

^○K. Ito¹, D. Kikuta¹, T. Narita¹, K. Kataoka¹, N. Isomura¹, K. Kitazumi¹, T. Mori¹ (1.Toyota Central R&D Labs. Inc.(Japan))

https://doi.org/10.7567/SSDM.2016.N-4-03