11:33 〜 11:36 [PS-9-12(Late News)] Gate-stack Engineering of Self-organized Nanospherical Ge-gate/SiO2/Si1-xGex-channel on Si (100) and Si (110) for Ge MOS Devices P. H. Liao1, C. W. Tien2, K. P. Peng2, H. C. Lin2, T. George1,○P. W. Li1,2 (1.National Central Univ.(Taiwan), 2.NCTU(Taiwan))
