4:40 PM - 4:55 PM
[B-2-04] Influence of Surface Treatment of SiO2 Gate Insulator for Pentacene-based OFETs with Nitrogen-doped LaB6 Bottom-Contact Electrode Formation Process
○Y. Maeda1, M. Hiroki1, S. Ohmi1
(1.Tokyo Tech (Japan))
https://doi.org/10.7567/SSDM.2017.B-2-04