The Japan Society of Applied Physics

10:50 AM - 11:10 AM

[K-3-05] Ge and O Valence States in GeOx Interfacial Layer on Hole Mobility of Low EOT Ge pMOSFET

J. -S. Li1, S. -H. Yi1, W. -Y. Hsu1, J. Huang1, C. -W. Hsu1, T. -Y. Wu1, D. -B. Ruan1, K. -S. Chang-Liao1 (1.National Tsing Hua Univ. (Taiwan))

https://doi.org/10.7567/SSDM.2017.K-3-05