11:53 AM - 11:55 AM
[PS-14-10 (Late News)] Normally-off MOSFET Properties Fabricated on Mg Implanted GaN Layers
○S. Takashima1, K. Ueno1, R. Tanaka1, H. Matsuyama1, M. Edo1, K. Nakagawa2
(1.Fuji Electric Co., Ltd. (Japan), 2.Univ. of Yamanashi (Japan))