The Japan Society of Applied Physics

11:59 AM - 12:01 PM

[PS-3-13 (Late News)] Hot-carrier Induced Drastic Off-state Leakage Current Degradation in STI-based N-channel LDMOS

K. Takahashi1, K. Komatsu1, T. Sakamoto1, K. Kimura1, F. Matsuoka1 (1.Toshiba Electronic Devices & Storage Corp. (Japan))