14:45 〜 15:00

[B-5-06] Impact of "struggle for oxygen" at oxidized interface on SiGe gate stacks

^○X. Li¹, Y. Noma¹, W. Song¹, T. Nishimura¹, A. Toriumi¹ (1.The University of Tokyo (Japan))

https://doi.org/10.7567/SSDM.2018.B-5-06