The Japan Society of Applied Physics

4:15 PM - 4:30 PM

[D-2-03] Demonstration of High Channel Mobility and Low Trapped Electron Density of SiO2/SiC (0-33-8) Interfaces

T. Masuda1, T. Hatakeyama1, S. Harada1, H. Yano2 (1.AIST (Japan), 2.Univ. of Tsukuba (Japan))

https://doi.org/10.7567/SSDM.2018.D-2-03