Impacts of Boron Concentration and Annealing Temperature on Electrical Characteristics of CoFeB/MgO/CoFeB Magnetic Tunnel Junction

H. Park

doi:https://doi.org/10.7567/SSDM.2018.PS-2-10

11:00 〜 13:30

[PS-2-10] Impacts of Boron Concentration and Annealing Temperature on Electrical Characteristics of CoFeB/MgO/CoFeB Magnetic Tunnel Junction

^○H. Park¹, A. Teramoto¹, J. Tsuchimoto^1,2, M. Hayashi^1,2, K. Hashimoto¹, R. Kuroda¹, S. Sugawa¹ (1.Tohoku Univ. (Japan), 2.Canon Anelva Corp. (Japan))

https://doi.org/10.7567/SSDM.2018.PS-2-10

2018 International Conference on Solid State Devices and Materials

[PS-2-10] Impacts of Boron Concentration and Annealing Temperature on Electrical Characteristics of CoFeB/MgO/CoFeB Magnetic Tunnel Junction