11:15 AM - 11:30 AM
[D-6-04] Electrical characteristics of 2D MoS2 ferroelectric memory transistor with ferroelectric Hf1-xZrxO2 gate structure
○S. Zhang1, Y. Liu1, G. Han1, J. Zhang1, Y. Hao1, X. Wang2
(1.Xidian Univ. (China), 2.Nanjing Univ. (China))
https://doi.org/10.7567/SSDM.2019.D-6-04