The Japan Society of Applied Physics

11:00 〜 11:15

[F-6-03] Ge / SiGe Multi Quantum Well Fabrication by Using Reduced Pressure Chemical Vapor Deposition

Y. Yamamoto1, O. Skibitzki1, M.A. Schubert1, M. Scuderi1,2, F. Reichmann1, M. Zöllner1, G. Capellini1,3, B. Tillack1,4 (1.IHP-Leibniz Institut für Innovative Mikroelectronik (Germany), 2.Istituto per la Microelettronica e Microsistemi (CNR-IMM) (Italy), 3.Univ. degli Studi Roma Tre (Italy), 4.Technische Univ. Berlin (Germany))

https://doi.org/10.7567/SSDM.2019.F-6-03