9:00 AM - 9:30 AM
[H-3-01 (Invited)] Ferroelectric HfO2 for Memory Applications and Unconventional Computing
○H. Mulaosmanovic1, E.T. Breyer1, U. Schröder1, T. Mikolajick1,2, S. Slesazeck1
(1.NaMLab gGmbH (Germany), 2.Chair of Nanoelectronic Materials (Germany))
https://doi.org/10.7567/SSDM.2019.H-3-01