2:00 PM - 2:30 PM

[J-1-01 (Invited)] Electromigration scaling limits of copper interconnects

^○O.V. Pedreira¹, H. Zahedmanesh¹, I. Ciofi¹, Z. TÖkei¹, K. Croes¹ (1.imec (Belgium))

https://doi.org/10.7567/SSDM.2019.J-1-01