10:45 〜 11:00

[N-6-02] The Impact of Stress and Parasitic RC in Sub-40nm MF and MR nMOSFETs for RF and mm-wave CMOS Applications

^○J.-C. Guo¹, Z.-C. Li¹, J.-M. Lin¹ (1.National Chiao Tung Univ. (Taiwan))

https://doi.org/10.7567/SSDM.2019.N-6-02