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[PS-1-19 (Late News)] Extremely low temperature selective epitaxial processes for advanced CMOS applications

A. Hikavyy¹,^○C. Porret¹, E. Rosseel¹, P. Favia¹, R. Loo¹ (1.imec (Belgium))

https://doi.org/10.7567/SSDM.2019.PS-1-19