Important of MoS<sub>2</sub>-Compound Sputtering even with Sulfur-Vapor Anneal for Chip-Size Fabrication

Shinya - Imai

doi:https://doi.org/10.7567/SSDM.2020.H-2-03

4:45 PM - 5:00 PM

[H-2-03] Important of MoS₂-Compound Sputtering even with Sulfur-Vapor Anneal for Chip-Size Fabrication

〇Shinya - Imai¹, Takuya - Hamada¹, Masaya - Hamada¹, Takanori - Shirokura¹, Iriya - Muneta¹, Kuniyuki - Kakushima¹, Tetsuya - Tatsumi¹, Shigetaka - Tomiya¹, Kazuo - Tsutsui ¹, Hitoshi Wakabayashi¹ (1. Tokyo Tech(Japan))

https://doi.org/10.7567/SSDM.2020.H-2-03

2020 International Conference on Solid State Devices and Materials

[H-2-03] Important of MoS2-Compound Sputtering even with Sulfur-Vapor Anneal for Chip-Size Fabrication

[H-2-03] Important of MoS₂-Compound Sputtering even with Sulfur-Vapor Anneal for Chip-Size Fabrication