セッション情報

EUV Lithography

[2A501-04] EUV Lithography I

2022年6月29日(水) 09:00 〜 10:40 EUV Lithography (A5)

Chairman:Takeo Watanabe(University of Hyogo), Shinji Yamakawa(University of Hyogo)

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09:00 〜 09:30

[2A501] Advanced Photoresists for 0.55 NA EUV Lithography: Status, Progress, and Challenges [Invited]

*Florian Gstrein^1,2 (1. Intel, 2. Components Research)

09:30 〜 10:00

[2A502] Controlled Sequence Photoresists from Polypeptoids [Invited]

Florian Kaefer¹, Zoey Meng², Rachel Segalman², *Christopher Ober¹ (1. Cornell University, 2. University of California at Santa Barbara)

10:00 〜 10:30

[2A503] Advances in high NA EUV patterning and fundamental radiation chemistry diagnostics [Invited]

*Patrick Naulleau¹ (1. Lawrence Berkeley National Laboratory)

10:30 〜 10:40

[2A504] 休憩