The 39th International Conference of Photopolymer Science and Technology

講演情報

193nm Lithography Extension and EUV HVM Readiness

[2A701-01] 193nm Lithography Extension and EUV HVM Readiness

2022年6月29日(水) 11:40 〜 12:00 193 nm Lithography Extension and EUV HVM Readiness (A7)

Chairman:Yoshio Kawai(Shin-Etsu Chemical), Tsukasa Azuma

11:40 〜 12:00

[2A701] Metal purifiers specific to lithography materials

*Yoshiaki Yamada1, Robb Fang2, Alexander Zhu2 (1. Nippon Cobetter Co., Ltd., 2. Hangzhou Cobetter filtration equipment Co., Ltd)