[17a-C1-1~8] 8.3 Plasma deposition of thin film and surface treatment

△ [17a-C1-5] Gas velocity dependence of cluster outflow amount from multi-hollow discharge plasmas

^○Susumu Toko¹, Yeon Won Kim¹, Yuji Hashimoto¹, Yoshinori Kanemitsu¹, Hyunwoong Seo¹, Giichiro Uchida¹, Kunihiro Kamataki¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (Kyushu Univ.¹)

Keywords:plasma CVD,水素化アモルファスシリコン,クラスター