The 74th JSAP Autumn Meeting,2013

Presentation information

Oral presentation

13. Semiconductors A (Silicon) » 13.5 Si process technology

[19p-B4-1~21] 13.5 Si process technology

Thu. Sep 19, 2013 1:30 PM - 7:00 PM B4 (TC2 1F-106)

3:30 PM - 3:45 PM

[19p-B4-9] Luminescence from SiO2 by Helium Ion Microscope (HIM) without any Damage Characterized by TEM-EELS

Shinichi Ogawa1, Tomohiko Iijima1, Ryuichi Sugie2, Naohiko Kawasaki2, Yuji Otsuka2 (AIST1, Toray Res. Ctr.2)

Keywords:ルミネッセンス,ヘリウムイオン顕微鏡,ダメージ