[27p-A3-1~17] 8.4 Plasma etching

[27p-A3-14] △Mechanism of Highly Selective and Damage-Free SiN Etching Using Neutral Beam

^○Daiki Nakayama¹, Akira Wada¹, Tomohiro Kubota¹, Seiji Samukawa^1,2 (IFS, Tohoku Univ.¹, WPI-AIMR, Tohoku Univ.²)

Keywords:中性粒子ビーム、窒化シリコンエッチング、フロロカーボンプラズマ